Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir
The wafer-level integration of high aspect ratio silicon nanostructures is an essential part of the fabrication of nanodevices.Metal-assisted chemical SHEA BUTTER CONDITIONER etching (MACE) is a promising low-cost and high-volume technique for the generation of vertically aligned silicon nanowires.Noble metal nanoparticles were used to locally etch